Stejskal, J. (1999) „Equipment for Deposition of High-temperature Superconducting Films by MOCVD Technology", Chemické listy, 93(1). Dostupné z: http://ww-w.chemicke-listy.cz/ojs3/index.php/chemicke-listy/article/view/2643 (Viděno: 25 listopad 2024).